Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US17012657Application Date: 2020-09-04
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Publication No.: US11209738B2Publication Date: 2021-12-28
- Inventor: Martinus Hendrikus Antonius Leenders , Nicolaas Rudolf Kemper , Joost Jeroen Ottens
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Information query
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