An electrical contact a mating portion for mating with a mating contact. The mating portion has a contact portion and a retention portion. The mating portion has a mating portion bottom wall, a mating portion top wall and mating portion side walls. A respective mating portion side wall has an upper portion which extends beyond the top wall. The retention portion has a retention portion top wall, a retention portion side wall and a retention portion back wall. The retention portion back wall is configured to approximate the space provided between the mating portion top wall, the upper portion of the respective mating portion side wall, the retention portion top wall and a retention portion side wall. The retention portion back wall prevents damage or deformation of the retention portion as a force applied to the retention portion.