- 专利标题: Wafer processing method and cutting apparatus
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申请号: US16989132申请日: 2020-08-10
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公开(公告)号: US11217466B2公开(公告)日: 2022-01-04
- 发明人: Yunfeng Yang , Yuji Uemura
- 申请人: DISCO CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: DISCO CORPORATION
- 当前专利权人: DISCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Greer Burns & Crain Ltd.
- 优先权: JPJP2019-149168 20190815
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; B28D5/04 ; H01L23/544
摘要:
A wafer processing method includes preparing a holding table having a blade clearance portion formed therein so as to correspond to a notch of a wafer, holding the wafer by the holding table so as to make the notch of the wafer correspond to the blade clearance portion of the holding table, reducing the diameter of the wafer by cutting the wafer by a cutting blade along an outer peripheral edge of the wafer in a state in which an end of the cutting blade is positioned below the holding surface of the holding table and therefore removing at least a part of the notch portion, and forming a second notch in the wafer by cutting the wafer in a thickness direction by the cutting blade along the blade clearance portion of the holding table.
公开/授权文献
- US20210050238A1 WAFER PROCESSING METHOD AND CUTTING APPARATUS 公开/授权日:2021-02-18
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