A monitoring support apparatus according to an aspect of the present disclosure is for supporting work of a monitoring person who monitors subjects by sequentially visiting the subjects and includes a measuring device that measures the subjects and the monitoring person by radiating a detecting wave toward the subjects and the monitoring person, a position specifying circuit that specifies positions of the subjects and a position of the monitoring person on the basis of information obtained by the measuring device, and a decision circuit that decides at least one selected from a group consisting of a next subject suitable as a subject to be visited next by the monitoring person among the subjects and a movement path along which the monitoring person moves from the position of the monitoring person to the next subject on the basis of the positions of the subjects and the position of the monitoring person.