Invention Grant
- Patent Title: Generating a training set usable for examination of a semiconductor specimen
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Application No.: US16916047Application Date: 2020-06-29
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Publication No.: US11232550B2Publication Date: 2022-01-25
- Inventor: Elad Ben Baruch , Shalom Elkayam , Shaul Cohen , Tal Ben-Shlomo
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd.
- Current Assignee: Applied Materials Israel Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Lowenstein Sandler LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06K9/62 ; G06T7/143

Abstract:
There is provided a system and method of generating a training set for training a Deep Neural Network usable for examination of a specimen. The method includes: for each given training image in a group: i) generating a first batch of training patches, including cropping the given training image into a first plurality of original patches; and augmenting at least part of the first plurality of original patches in order to simulate variations caused by a physical process of the specimen; and ii) generating a second batch of training patches, including: shifting the plurality of first positions on the given training image to obtain a second plurality of original patches, and repeating the augmenting to the second plurality of original patches to generate a second plurality of augmented patches; and including at least the first second batches of training patches corresponding to each given training image in the training set.
Public/Granted literature
- US20210407072A1 GENERATING A TRAINING SET USABLE FOR EXAMINATION OF A SEMICONDUCTOR SPECIMEN Public/Granted day:2021-12-30
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