Invention Grant
- Patent Title: Defect pattern grouping method and system
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Application No.: US16479138Application Date: 2018-01-18
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Publication No.: US11238579B2Publication Date: 2022-02-01
- Inventor: Wei Fang , Haili Zhang , Zhichao Chen , Shengcheng Jin
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL AH Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL AH Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- International Application: PCT/EP2018/051162 WO 20180118
- International Announcement: WO2018/134286 WO 20180726
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G03F7/20 ; G05B19/406

Abstract:
A defect pattern grouping method is disclosed. The defect pattern grouping method comprises obtaining a first polygon that represents a first defect from an image of a sample, comparing the first polygon with a set of one or more representative polygons of a defect-pattern collection, and grouping the first polygon with any one or more representative polygons identified based on the comparison.
Public/Granted literature
- US20190333205A1 DEFECT PATTERN GROUPING METHOD AND SYSTEM Public/Granted day:2019-10-31
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