A method of manufacturing a display apparatus includes: forming first patterns of a semiconductor material on a base layer; forming a first insulating layer covering the first patterns; forming second patterns of a conductive material on the first insulating layer; removing at least a portion of at least one of the second patterns; and forming a second insulating layer on the second patterns. Each of the second patterns includes a first layer and a second layer disposed on the first layer, the first patterns include a semiconductor pattern, the second patterns include a control electrode pattern overlapping with the semiconductor pattern in a plan view and a sensing electrode pattern, the second layer of the control electrode pattern fully covers the first layer of the control electrode pattern, and the second layer of the sensing electrode pattern is partially removed in the removing of the at least a portion to partially cover the first layer of the sensing electrode pattern.