- 专利标题: Dummy vertical structures for etching in 3D NAND memory and other circuits
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申请号: US16782953申请日: 2020-02-05
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公开(公告)号: US11257836B2公开(公告)日: 2022-02-22
- 发明人: Chih-Wei Hu , Teng-Hao Yeh , Yu-Wei Jiang
- 申请人: MACRONIX INTERNATIONAL CO., LTD.
- 申请人地址: TW Hsinchu
- 专利权人: MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人: MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Haynes Beffel & Wolfeld LLP
- 代理商 Andrew Dunlap
- 主分类号: H01L27/11582
- IPC分类号: H01L27/11582 ; H01L27/11565
摘要:
A memory device comprises a stack of patterned conductor layers, at least a plurality of the layers comprising conductive strips including strips continuous with a pad and other strips isolated from the pad. An array of vertical pillars extends through the stack of patterned conductor layers, wherein memory cells are disposed at cross-points between the vertical pillars and patterned conductor layers. The array has an array boundary proximal to the pad. A first set of isolation blocks extends through the plurality of patterned conductor layers separating the strips continuous with the pad from the other strips isolated from the pad. A second set of isolation blocks inside the array boundary extends through the plurality of patterned conductor layers isolating the other strips from the pad.
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