An alignment method, an alignment device and evaporation equipment are provided. The alignment device includes: a first alignment module, located outside an evaporation chamber and configured to determine relative position information between a substrate to be evaporated and a mask for evaporation; a second alignment module, located in the evaporation chamber and configured to adjust a position of the substrate to be evaporated and/or the mask for evaporation according to the relative position information until an orthographic projection of a first alignment mark of the substrate to be evaporated on the mask for evaporation at least partially overlaps a hollowed area of the mask for evaporation, obtain position information of the first alignment mark through the hollowed area, and adjust a position of the substrate to be evaporated and/or the mask for evaporation according to the position information.