Invention Grant
- Patent Title: Frame assembly, lithographic apparatus and device manufacturing method
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Application No.: US17049719Application Date: 2019-04-04
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Publication No.: US11269262B2Publication Date: 2022-03-08
- Inventor: Hans Butler , Joep Sander De Beer , Cornelius Adrianus Lambertus De Hoon , Jeroen Pieter Starreveld , Martinus Van Duijnhoven , Maurice Willem Jozef Etiënne Wijckmans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18169261 20180425
- International Application: PCT/EP2019/058504 WO 20190404
- International Announcement: WO2019/206595 WO 20191031
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.
Public/Granted literature
- US20210240090A1 Frame Assembly, Lithographic Apparatus and Device Manufacturing Method Public/Granted day:2021-08-05
Information query
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