Invention Grant
- Patent Title: Methods for graphene formation using microwave surface-wave plasma on dielectric materials
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Application No.: US16585929Application Date: 2019-09-27
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Publication No.: US11289331B2Publication Date: 2022-03-29
- Inventor: Jie Zhou , Erica Chen , Qiwei Liang , Chentsau Chris Ying , Srinivas D. Nemani , Ellie Y. Yieh
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/02 ; C23C16/26
Abstract:
A method of forming graphene layers is disclosed. A method of improving graphene deposition is also disclosed. Some methods are advantageously performed at lower temperatures. Some methods advantageously provide graphene layers with lower resistance. Some methods advantageously provide graphene layers in a relatively short period of time.
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