Invention Grant
- Patent Title: Integrated circuit with electrostatic discharge protection
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Application No.: US16943882Application Date: 2020-07-30
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Publication No.: US11289472B2Publication Date: 2022-03-29
- Inventor: Po-Lin Peng , Yu-Ti Su
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H02H9/04

Abstract:
An integrated circuit includes an input/output (I/O) pad, an electrostatic discharge (ESD) primary circuit and a bias voltage generator. The electrostatic discharge primary circuit includes a first transistor. A first terminal of the first transistor is coupled to the I/O pad. The bias voltage generator is configured to provide a gate bias signal to the gate terminal of the first transistor. The bias voltage generator provides the gate bias signal at a first voltage level in response to that an ESD event occurs on the I/O pad. The bias voltage generator provides the gate bias signal at a second voltage level in response to that no ESD event occurs on the I/O pad. The first voltage level is lower than the second voltage level.
Public/Granted literature
- US20220037310A1 INTEGRATED CIRCUIT WITH ELECTROSTATIC DISCHARGE PROTECTION Public/Granted day:2022-02-03
Information query
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