Invention Grant
- Patent Title: Field effect transistor
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Application No.: US16874033Application Date: 2020-05-14
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Publication No.: US11289600B2Publication Date: 2022-03-29
- Inventor: Byounggun Choi
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Kile Park Reed & Houtteman PLLC
- Priority: KR10-2019-0058000 20190517
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/78 ; H01L29/20

Abstract:
Provided is a field effect transistor including a semiconductor layer, a gate electrode provided on a channel region in the semiconductor layer, and a channel adjusting member provided adjacent to the channel region on one surface of the semiconductor layer and overlapping the gate electrode on a plane. Here, the channel adjusting member provides a depletion layer in the channel region.
Information query
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