Invention Grant
- Patent Title: Method for manufacturing circuit board
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Application No.: US16843123Application Date: 2020-04-08
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Publication No.: US11294285B2Publication Date: 2022-04-05
- Inventor: Xian-Qin Hu , Mei Yang , Jun Dai
- Applicant: HongQiSheng Precision Electronics (QinHuangDao) Co., Ltd. , Avary Holding (Shenzhen) Co., Limited.
- Applicant Address: CN Qinhuangdao; CN Shenzhen
- Assignee: HongQiSheng Precision Electronics (QinHuangDao) Co., Ltd.,Avary Holding (Shenzhen) Co., Limited.
- Current Assignee: HongQiSheng Precision Electronics (QinHuangDao) Co., Ltd.,Avary Holding (Shenzhen) Co., Limited.
- Current Assignee Address: CN Qinhuangdao; CN Shenzhen
- Agency: ScienBiziP, P.C.
- Priority: CN201710954369.X 20171013
- Main IPC: G03F7/095
- IPC: G03F7/095 ; C23C30/00 ; H05K3/38 ; H05K3/06 ; C23G1/10 ; C23C28/02 ; H05K3/40 ; H05K3/18 ; H05K1/09 ; C23F1/44 ; C23F1/02 ; G03F7/20

Abstract:
A method for manufacturing the circuit board comprises following steps of forming a silver layer on each of two opposite surfaces of an insulating substrate, and forming a copper layer on each silver layer, thereby obtaining a middle structure; defining at least one through-hole on the middle structure, and each through-hole extending through each copper layer; forming a copper wiring layer on the copper layers to cover each through-hole and a portion region of the copper layers, the copper wiring layer comprising a copper conductive structure passing through each through-hole, the copper conductive structure connecting the copper layers; removing the copper layers not covered by the copper wiring layer; and etching the silver layers to form a silver wiring layer corresponding to the copper wiring layer, wherein a first etching liquid, which does not etch the copper wiring layer, is used for etching the silver layers.
Public/Granted literature
- US20200236783A1 METHOD FOR MANUFACTURING CIRCUIT BOARD Public/Granted day:2020-07-23
Information query
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