Invention Grant
- Patent Title: Regulating deposition characteristics
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Application No.: US16768846Application Date: 2017-12-14
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Publication No.: US11305569B2Publication Date: 2022-04-19
- Inventor: Mauricio Seras Franzoso , Andreas Muller , Antonio Gracia Verdugo
- Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- Applicant Address: US TX Spring
- Assignee: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- Current Assignee: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- Current Assignee Address: US TX Spring
- Agency: HP Inc. Patent Department
- International Application: PCT/US2017/066399 WO 20171214
- International Announcement: WO2019/117918 WO 20190620
- Main IPC: B41M5/00
- IPC: B41M5/00
Abstract:
A method for regulating a deposition characteristic of a rendering material in a rendering apparatus includes determining a status of material deposition structure, and adjusting a physical attribute of the material deposition structure.
Public/Granted literature
- US20200369060A1 REGULATING DEPOSITION CHARACTERISTICS Public/Granted day:2020-11-26
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