Invention Grant
- Patent Title: Multi-layer structure to increase crystalline temperature of a selector device
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Application No.: US17081138Application Date: 2020-10-27
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Publication No.: US11309492B2Publication Date: 2022-04-19
- Inventor: Hai-Dang Trinh
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
In some embodiments, a semiconductor device is provided. The semiconductor device includes a first amorphous switching structure disposed over a first electrode. A buffer structure is disposed over the first amorphous switching structure. A second amorphous switching structure is disposed over the buffer structure. A second electrode is disposed over the second amorphous switching structure, where the first and second amorphous switching structures are configured to switch between low resistance states and high resistance states depending on whether a voltage from the first electrode to the second electrode exceeds a threshold voltage.
Public/Granted literature
- US20210043835A1 MULTI-LAYER STRUCTURE TO INCREASE CRYSTALLINE TEMPERATURE OF A SELECTOR DEVICE Public/Granted day:2021-02-11
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