Invention Grant
- Patent Title: Semiconductor manufacturing inspection system
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Application No.: US16882266Application Date: 2020-05-22
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Publication No.: US11315234B2Publication Date: 2022-04-26
- Inventor: Motoki Iinuma
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JPJP2019-178253 20190930
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/95

Abstract:
An object of the present invention is to accurately measure the heights of wire loops densely disposed in a power module. A semiconductor manufacturing inspection system includes: an single-color illumination unit including a plurality of LED chips to emit light beams to a plurality of wire loops connected to surfaces of semiconductor elements; a camera to capture images of the wire loops; and an image processor to recognize an imaging region of each of the wire loops from the images, based on a luminance value and to measure the height of each of the wire loops based on the imaging region of the wire loop in the images. The LED chips emit the light beams to the separate wire loops, and the light beams emitted from two of the LED chips to adjacent two of the wire loops differ in luminance.
Public/Granted literature
- US20210097670A1 SEMICONDUCTOR MANUFACTURING INSPECTION SYSTEM Public/Granted day:2021-04-01
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