Invention Grant
- Patent Title: EBeam inspection method
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Application No.: US14952067Application Date: 2015-11-25
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Publication No.: US11315237B2Publication Date: 2022-04-26
- Inventor: Wei Fang
- Applicant: Hermes Microvision, Inc.
- Applicant Address: TW Hisnchu
- Assignee: Hermes Microvision, Inc.
- Current Assignee: Hermes Microvision, Inc.
- Current Assignee Address: TW Hisnchu
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T7/30 ; G01N23/2251
Abstract:
An image is obtained by using a charged particle beam, and a design layout information is generated to select patterns of interest. Grey levels among patterns can be compared with each other to identify abnormal, or grey levels within one pattern can be compared to a determined threshold grey level to identify abnormal.
Public/Granted literature
- US20160314572A1 EBeam Inspection Method Public/Granted day:2016-10-27
Information query
