Invention Grant
- Patent Title: Thin-film transistor and manufacturing method thereof
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Application No.: US16094479Application Date: 2018-09-07
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Publication No.: US11316049B2Publication Date: 2022-04-26
- Inventor: Huafei Xie , Shujhih Chen
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Guangdong
- Agency: Soroker Agmon Nordman
- Priority: CN201810728134.3 20180705
- International Application: PCT/CN2018/104532 WO 20180907
- International Announcement: WO2020/006858 WO 20200109
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66

Abstract:
A thin-film transistor and a manufacturing method thereof are provided, and the manufacturing method includes: forming a source electrode, a drain electrode and a planarization layer on a substrate, and patterning the planarization layer to form a first portion disposed between the source electrode and the drain electrode, a second portion disposed at a side of the source drain, and a third portion disposed at a side of the drain electrode. Upper surfaces of all the first portion, the second portion, and the third surface are flush with top portions of both the source electrode and the drain electrode.
Public/Granted literature
- US20210226068A1 THIN-FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-07-22
Information query
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