Invention Grant
- Patent Title: Semiconductor device including storage node electrode including step and method of manufacturing the semiconductor device
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Application No.: US16943019Application Date: 2020-07-30
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Publication No.: US11322499B2Publication Date: 2022-05-03
- Inventor: Jaehwan Cho , Junghwan Oh , Sangho Lee , Junwon Lee , Jinwoo Bae , Sunghee Han , Yoosang Hwang
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0179040 20191231
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
A semiconductor device may include a bottom sub-electrode on a substrate, a top sub-electrode on the bottom sub-electrode, a dielectric layer covering the bottom and top sub-electrodes, and a plate electrode on the dielectric layer. The top sub-electrode may include a step extending from a side surface thereof, which is adjacent to the bottom sub-electrode, to an inner portion of the top sub-electrode. The top sub-electrode may include a lower portion at a level that is lower than the step and an upper portion at a level which is higher than the step. A maximum width of the lower portion may be narrower than a minimum width of the upper portion. The maximum width of the lower portion may be narrower than a width of a top end of the bottom sub-electrode. The bottom sub-electrode may include a recess in a region adjacent to the top sub-electrode.
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Information query
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