Invention Grant
- Patent Title: Additive manufacturing with dithering scan path
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Application No.: US16189740Application Date: 2018-11-13
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Publication No.: US11331855B2Publication Date: 2022-05-17
- Inventor: Zhengping Yao , Paul J. Steffas
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B29C64/268
- IPC: B29C64/268 ; B29C64/277 ; B22F3/00 ; B33Y10/00 ; B33Y30/00 ; B22F3/18 ; B22F12/00 ; G02B26/10 ; G02B26/12 ; G02B7/182 ; B33Y70/00 ; B33Y40/00 ; B29C64/153 ; B22F10/10

Abstract:
An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material on a platform, a light source configured to generate a light beam, an auxiliary polygon mirror scanner configured to receive the light beam from the light source and reflect the light beam, and a primary mirror scanner to receive the light beam reflected by the auxiliary polygon mirror scanner and direct the light beam to impinge on an exposed layer of feed material.
Public/Granted literature
- US20190143595A1 ADDITIVE MANUFACTURING WITH DITHERING SCAN PATH Public/Granted day:2019-05-16
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