Invention Grant
- Patent Title: Position sensor
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Application No.: US17254601Application Date: 2019-06-05
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Publication No.: US11333985B2Publication Date: 2022-05-17
- Inventor: Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Johannes Antonius Gerardus Akkermans , Arie Jeffrey Den Boef
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBierardino McGovern IP Group LLC
- Priority: EP18182091 20180706
- International Application: PCT/EP2019/064661 WO 20190605
- International Announcement: WO2020/007558 WO 20200109
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.
Public/Granted literature
- US20210124276A1 POSITION SENSOR Public/Granted day:2021-04-29
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