Invention Grant
- Patent Title: Extreme ultraviolet light generation system and electronic device manufacturing method
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Application No.: US16894657Application Date: 2020-06-05
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Publication No.: US11337293B2Publication Date: 2022-05-17
- Inventor: Takanari Kobayashi , Hirokazu Hosoda
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JPJP2019-135009 20190723
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20

Abstract:
An extreme ultraviolet light generation system includes: a chamber; a target generation unit; a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that fluence of the first pre-pulse laser beam is 1.5 J/cm2 to 16 J/cm2 inclusive at a position where a target is irradiated with the first pre-pulse laser beam; and a control unit configured to control the laser system so that a first delay time from a timing of irradiation of the target with the first pre-pulse laser beam to a timing of irradiation with the second pre-pulse laser beam and a second delay time from the timing of irradiation of the target with the second pre-pulse laser beam to a timing of irradiation with the main pulse laser beam have a following relation: the first delay time
Public/Granted literature
- US20210026254A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD Public/Granted day:2021-01-28
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