• Patent Title: Composition for heat cycle system, and heat cycle system
  • Application No.: US16439367
    Application Date: 2019-06-12
  • Publication No.: US11339314B2
    Publication Date: 2022-05-24
  • Inventor: Hidekazu Okamoto
  • Applicant: AGC Inc.
  • Applicant Address: JP Chiyoda-ku
  • Assignee: AGC Inc.
  • Current Assignee: AGC Inc.
  • Current Assignee Address: JP Chiyoda-ku
  • Agency: Element IP, PLC
  • Priority: JPJP2014-033346 20140224,JPJP2014-127748 20140620
  • Main IPC: C09K5/04
  • IPC: C09K5/04 F25B13/00 F25B25/00
Composition for heat cycle system, and heat cycle system
Abstract:
To provide a composition for a heat cycle system comprising trifluoroethylene (HFO-1123), which has a low global warming potential and excellent cycle performance of HFO-1123 and which has high durability, and a heat cycle system employing the composition, which has less influence over global warming and has both high cycle performance and durability.
A composition for a heat cycle system, which comprises a working fluid for heat cycle containing trifluoroethylene, and a radical scavenger, and a heat cycle system employing the composition for a heat cycle system.
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