Invention Grant
- Patent Title: Scan signal characterization diagnostics
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Application No.: US16961081Application Date: 2018-12-19
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Publication No.: US11347152B2Publication Date: 2022-05-31
- Inventor: Cornelis Melchior Brouwer , Krishanu Shome
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2018/085918 WO 20181219
- International Announcement: WO2019/141481 WO 20190725
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
Information query
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