Invention Grant
- Patent Title: Non-volatile memory device
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Application No.: US16863736Application Date: 2020-04-30
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Publication No.: US11348910B2Publication Date: 2022-05-31
- Inventor: Chanho Kim , Kyunghwa Yun , Daeseok Byeon
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2019-0108469 20190902
- Main IPC: H01L25/18
- IPC: H01L25/18 ; H01L25/065 ; H01L23/00 ; G11C16/04 ; G11C16/08

Abstract:
A non-volatile memory device includes a first semiconductor layer having a stair area and a cell area having a memory cell array formed therein, and a second semiconductor layer including a page buffer connected to the memory cell array. The first semiconductor layer includes a plurality of word lines, a ground selection line in a layer on the word lines, a common source line in a layer on the ground selection line, a plurality of vertical pass transistors in the stair area, and a plurality of driving signal lines in the same layer as the common source line. The word lines form a stair shape in the stair area, and each of the vertical pass transistors is connected between a corresponding one of the word lines and a corresponding one of the driving signal lines.
Public/Granted literature
- US20210066278A1 NON-VOLATILE MEMORY DEVICE Public/Granted day:2021-03-04
Information query
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