Invention Grant
- Patent Title: Method and apparatus for controlling a computing process
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Application No.: US16463430Application Date: 2017-11-24
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Publication No.: US11353797B2Publication Date: 2022-06-07
- Inventor: Yen-Wen Lu , Xiaorui Chen , Yang Lin
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pitman LLP
- International Application: PCT/EP2017/080324 WO 20171124
- International Announcement: WO2018/104073 WO 20180614
- Main IPC: G05B19/418
- IPC: G05B19/418 ; G03F7/20

Abstract:
A method of controlling a computer process for designing or verifying a photolithographic component includes building a source tree including nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.
Public/Granted literature
- US20210208510A1 METHOD AND APPARATUS FOR CONTROLLING A COMPUTING PROCESS Public/Granted day:2021-07-08
Information query
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