Invention Grant
- Patent Title: Methods and systems for monitoring input power for process control in semiconductor process systems
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Application No.: US17125178Application Date: 2020-12-17
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Publication No.: US11355325B2Publication Date: 2022-06-07
- Inventor: Ramesh Gopalan , Hemant Mungekar , Guomin Mao , Rongping Wang , Teryl Pratt
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H05H1/00
- IPC: H05H1/00 ; H01J37/32
Abstract:
Methods and apparatus for plasma processing are provided herein. For example, apparatus can include a system for plasma processing including a remote plasma source including a supply terminal configured to connect to a power source and an output configured to deliver RF power to a plasma block of the remote plasma source for creating a plasma and a controller configured to control operation of the remote plasma source based on a measured input power at the supply terminal.
Public/Granted literature
- US20210375601A1 METHODS AND SYSTEMS FOR MONITORING INPUT POWER FOR PROCESS CONTROL IN SEMICONDUCTOR PROCESS SYSTEMS Public/Granted day:2021-12-02
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