- 专利标题: Detection element, manufacturing method thereof, flat panel detector
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申请号: US16331326申请日: 2018-08-23
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公开(公告)号: US11355534B2公开(公告)日: 2022-06-07
- 发明人: Xuecheng Hou , Pengcheng Tian , Chuncheng Che , Chia Chiang Lin , Xin Li
- 申请人: BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD
- 申请人地址: CN Beijing; CN Beijing
- 专利权人: BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD
- 当前专利权人: BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD
- 当前专利权人地址: CN Beijing; CN Beijing
- 代理机构: Dilworth & Barrese, LLP.
- 代理商 Michael J. Musella, Esq.
- 优先权: CN201710967141.4 20171017
- 国际申请: PCT/CN2018/101951 WO 20180823
- 国际公布: WO2019/076130 WO 20190425
- 主分类号: H01L27/146
- IPC分类号: H01L27/146
摘要:
A detection element, a manufacturing method thereof and a flat panel detector are disclosed. The detection element includes: a base substrate; a photodiode on the base substrate, the photodiode includes: a first electrode on the base substrate; a photoelectric conversion layer on a side of the first electrode away from the base substrate; a transparent electrode and a second electrode electrically connected with the transparent electrode on a side of the photoelectric conversion layer away from the first electrode. Besides, an orthographic projection of the photoelectric conversion layer on the base substrate completely falls within an orthographic projection of the first electrode on the base substrate; the photoelectric conversion layer includes a sidewall, an orthographic projection of the sidewall of the photoelectric conversion layer on the base substrate is at least partially overlapped with an orthographic projection of the second electrode on the base substrate.
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