Invention Grant
- Patent Title: Semiconductor device, layout design method for the same and method for fabricating the same
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Application No.: US16857288Application Date: 2020-04-24
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Publication No.: US11355604B2Publication Date: 2022-06-07
- Inventor: Ji Su Yu , Hyeon Gyu You , Seung Man Lim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0124324 20191008
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L27/088 ; H01L29/40 ; H01L29/78 ; H01L23/522 ; G06F30/392 ; G06F30/3953 ; H01L29/423 ; H01L29/66 ; H01L23/528 ; G06F119/06

Abstract:
A semiconductor device includes a first and second active pattern extending in a first direction on a substrate, a first and second gate electrode extending in a second direction to intersect the first and second active pattern, a first source/drain contact extending in the second direction and connected to a first and source/drain region of the first and second active patterns, respectively, a first source/drain via connected to the first source/drain contact, a first cell separation film extending in the second direction and crosses the first active pattern and the second active pattern, between the first source/drain contact and the second gate electrode, a first gate via connected to the second gate electrode and arranged with the first source/drain via along the first direction, and a first connection wiring which extending in the first direction and connects the first source/drain via and the first gate via.
Public/Granted literature
- US20210104611A1 SEMICONDUCTOR DEVICE, LAYOUT DESIGN METHOD FOR THE SAME AND METHOD FOR FABRICATING THE SAME Public/Granted day:2021-04-08
Information query
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