Invention Grant
- Patent Title: Phase shift mask, array substrate, fabrication method thereof and display apparatus
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Application No.: US16346192Application Date: 2018-11-01
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Publication No.: US11360378B2Publication Date: 2022-06-14
- Inventor: Xiaoxiang Zhang , Mingxuan Liu , Huibin Guo , Wenqing Xu , Xiaolong Li , Zumou Wu , Yongzhi Song
- Applicant: BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing; CN Beijing
- Assignee: BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing; CN Beijing
- Agency: WHDA, LLP
- Priority: CN201810142882.3 20180211
- International Application: PCT/CN2018/113454 WO 20181101
- International Announcement: WO2019/153804 WO 20190815
- Main IPC: G03F1/26
- IPC: G03F1/26 ; H01L29/66 ; H01L27/12

Abstract:
A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion (02) on the substrate (01). The wiring light shielding portion (02) includes a light shielding region (021) and a phase shift region (022). In a direction perpendicular to the extending direction of the wiring light shielding portion (02) a width of the light shielding region (021) is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion (02).
Public/Granted literature
- US20210333704A1 PHASE SHIFT MASK, ARRAY SUBSTRATE, FABRICATION METHOD THEREOF AND DISPLAY APPARATUS Public/Granted day:2021-10-28
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