Invention Grant
- Patent Title: Bandwidth calculation system and method for determining a desired wavelength bandwidth for a measurement beam in a mark detection system
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Application No.: US17057619Application Date: 2019-05-02
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Publication No.: US11360403B2Publication Date: 2022-06-14
- Inventor: Jia Wang , Jacob Fredrik Friso Klinkhamer , Hua Li
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18173977 20180524
- International Application: PCT/EP2019/061174 WO 20190502
- International Announcement: WO2019/223976 WO 20191128
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00

Abstract:
Disclosed is a bandwidth calculation system for determining a desired wavelength bandwidth for a measurement beam in a mark detection system, the bandwidth calculation system comprising a processing unit configured to determine the desired wavelength bandwidth based on mark geometry information, e.g. comprising mark depth information representing a depth of a mark. In an embodiment the desired wavelength bandwidth is based on a period and/or a variance parameter of a mark detection error function. The invention further relates to a mark detection system, a position measurement system and a lithographic apparatus comprising the bandwidth calculation system, as well as a method for determining a desired wavelength bandwidth.
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