- 专利标题: Semiconductor device, method of fabricating the same, and display device including the same
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申请号: US16842933申请日: 2020-04-08
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公开(公告)号: US11362247B2公开(公告)日: 2022-06-14
- 发明人: Kiho Kong , Junhee Choi , Jinjoo Park , Joohun Han
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2019-0118376 20190925
- 主分类号: H01L33/64
- IPC分类号: H01L33/64 ; H01L33/62 ; H01L33/38 ; H01L27/15
摘要:
A semiconductor device includes a substrate including a first region and a second region that are arranged in a first direction that is parallel to an upper surface of the substrate; a separation layer provided on the first region of the substrate; a high electron mobility transistor (HEMT) device overlapping the separation layer in a second direction that is perpendicular to the upper surface of the substrate; a light-emitting device provided on the second region of the substrate; and a first insulating pattern covering a side surface of the HEMT device, wherein the first insulating pattern overlaps the separation layer in the second direction.
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