Invention Grant
- Patent Title: Sidewall protection for PCRAM device
-
Application No.: US16509105Application Date: 2019-07-11
-
Publication No.: US11362277B2Publication Date: 2022-06-14
- Inventor: Yu-Chao Lin , Yuan-Tien Tu , Shao-Ming Yu , Tung-Ying Lee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
A method of forming a phase change random access memory (PCRAM) device includes forming a phase change element over a bottom electrode and a top electrode over the phase change element, forming a protection layer around the phase change element, and forming a nitrogen-containing sidewall spacer layer around the protection layer after forming the protection layer.
Public/Granted literature
- US20200152870A1 SIDEWALL PROTECTION FOR PCRAM DEVICE Public/Granted day:2020-05-14
Information query
IPC分类: