Invention Grant
- Patent Title: Wide-band wavelength film, method for producing same, and method for producing circular polarization film
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Application No.: US16340688Application Date: 2017-10-27
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Publication No.: US11366258B2Publication Date: 2022-06-21
- Inventor: Takao Kobayashi , Shunsuke Takagi
- Applicant: ZEON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kenja IP Law PC
- Priority: JPJP2016-213324 20161031,JPJP2017-204740 20171023
- International Application: PCT/JP2017/038998 WO 20171027
- International Announcement: WO2018/079745 WO 20180503
- Main IPC: G02B5/30
- IPC: G02B5/30 ; B32B7/023 ; B29D11/00 ; B32B27/08 ; B32B7/02 ; B29C55/04

Abstract:
A method for producing a broadband wavelength film including, in this order: a first step of preparing a layer (A) as a long-length obliquely stretched film; a second step of forming on the layer (A) a layer (B) of a resin having a negative intrinsic birefringence to obtain a multilayer film; and a third step of stretching the multilayer film to obtain a long-length broadband wavelength film including a λ/2 layer and a λ/4 layer.
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