Invention Grant
- Patent Title: Dual additive composition for polishing memory hard disks exhibiting edge roll off
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Application No.: US16729905Application Date: 2019-12-30
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Publication No.: US11384253B2Publication Date: 2022-07-12
- Inventor: Tong Li
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt; Erika R. Singleton
- Main IPC: C09G1/02
- IPC: C09G1/02 ; H01L21/321 ; C09K13/00 ; H01L21/306 ; C23F1/30 ; G11B5/84 ; C23F3/06
Abstract:
The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising colloidal silica, (b) a compound of formula (I), (c) a compound of formula (II), (d) hydrogen peroxide, and (e) water, wherein the polishing composition has a pH of about 1 to about 5. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting the substrate with the inventive chemical-mechanical polishing composition.
Public/Granted literature
- US20200224057A1 DUAL ADDITIVE COMPOSITION FOR POLISHING MEMORY HARD DISKS EXHIBITING EDGE ROLL OFF Public/Granted day:2020-07-16
Information query
