- Patent Title: Method and apparatus to determine a patterning process parameter
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Application No.: US16881991Application Date: 2020-05-22
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Publication No.: US11409204B2Publication Date: 2022-08-09
- Inventor: Sergey Tarabrin
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP17189728 20170907
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
Public/Granted literature
- US20200285157A1 METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER Public/Granted day:2020-09-10
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