Invention Grant
- Patent Title: Method and apparatus for embossing a substrate
-
Application No.: US15889892Application Date: 2018-02-06
-
Publication No.: US11413804B2Publication Date: 2022-08-16
- Inventor: Seemit Praharaj , Michael Jon Levy , Anthony S. Condello
- Applicant: Xerox Corporation
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Main IPC: B29C59/04
- IPC: B29C59/04 ; B29C33/38 ; B41J2/01 ; D06C23/04 ; B29C33/40 ; B41M5/00 ; B41M7/00 ; B31F1/07 ; B29C33/72 ; B29C35/08

Abstract:
An apparatus and method for embossing a substrate are disclosed. For example, the apparatus includes an embossing platform, a printhead to dispense ink on the embossing platform in a desired raised pattern on the embossing platform, a press to apply a load against a substrate placed on the desired raised pattern and the embossing platform to emboss the desired raised pattern onto the substrate, and an ink removal device to remove the ink that is dispensed on the embossing platform in the desired raised pattern.
Public/Granted literature
- US20190240873A1 METHOD AND APPARATUS FOR EMBOSSING A SUBSTRATE Public/Granted day:2019-08-08
Information query