- 专利标题: Method and apparatus for embossing a substrate
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申请号: US15889892申请日: 2018-02-06
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公开(公告)号: US11413804B2公开(公告)日: 2022-08-16
- 发明人: Seemit Praharaj , Michael Jon Levy , Anthony S. Condello
- 申请人: Xerox Corporation
- 申请人地址: US CT Norwalk
- 专利权人: Xerox Corporation
- 当前专利权人: Xerox Corporation
- 当前专利权人地址: US CT Norwalk
- 主分类号: B29C59/04
- IPC分类号: B29C59/04 ; B29C33/38 ; B41J2/01 ; D06C23/04 ; B29C33/40 ; B41M5/00 ; B41M7/00 ; B31F1/07 ; B29C33/72 ; B29C35/08
摘要:
An apparatus and method for embossing a substrate are disclosed. For example, the apparatus includes an embossing platform, a printhead to dispense ink on the embossing platform in a desired raised pattern on the embossing platform, a press to apply a load against a substrate placed on the desired raised pattern and the embossing platform to emboss the desired raised pattern onto the substrate, and an ink removal device to remove the ink that is dispensed on the embossing platform in the desired raised pattern.
公开/授权文献
- US20190240873A1 METHOD AND APPARATUS FOR EMBOSSING A SUBSTRATE 公开/授权日:2019-08-08