Invention Grant
- Patent Title: Antireflection film, optical element, and optical system
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Application No.: US16813703Application Date: 2020-03-09
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Publication No.: US11422290B2Publication Date: 2022-08-23
- Inventor: Seigo Nakamura , Tatsuya Yoshihiro , Kenichi Umeda , Yuichiro Itai
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JPJP2017-181424 20170921
- Main IPC: G02B1/115
- IPC: G02B1/115 ; C03C17/34 ; C03C17/36 ; G02B1/04

Abstract:
An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.
Public/Granted literature
- US20200209436A1 ANTIREFLECTION FILM, OPTICAL ELEMENT, AND OPTICAL SYSTEM Public/Granted day:2020-07-02
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