Invention Grant
- Patent Title: Vibration isolation system and lithographic apparatus
-
Application No.: US17053021Application Date: 2019-04-23
-
Publication No.: US11422477B2Publication Date: 2022-08-23
- Inventor: Roy Hendrikus Emilie Maria Jacobs , Cornelius Adrianus Lambertus De Hoon , Jeroen Pieter Starreveld , Johannes Petrus Martinus Bernardus Vermeulen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18171249 20180508
- International Application: PCT/EP2019/060281 WO 20190423
- International Announcement: WO2019/214930 WO 20191114
- Main IPC: G03F7/20
- IPC: G03F7/20 ; F16F13/00 ; F16F15/023 ; F16F15/04

Abstract:
The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.
Public/Granted literature
- US20210080835A1 Vibration Isolation System and Lithographic Apparatus Public/Granted day:2021-03-18
Information query
IPC分类: