Invention Grant
- Patent Title: Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
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Application No.: US16806266Application Date: 2020-03-02
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Publication No.: US11429763B2Publication Date: 2022-08-30
- Inventor: Remco Dirks , Markus Gerardus Martinus Maria Van Kraaij , Maxim Pisarenco
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15177294 20150717
- Main IPC: G06F30/20
- IPC: G06F30/20 ; H01L21/66 ; H01L21/3065 ; H01L21/308 ; G03F7/20

Abstract:
Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.
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