Invention Grant
- Patent Title: RF treatment apparatus, method of controlling RF treatment apparatus and skin treatment method using RF energy
-
Application No.: US16070495Application Date: 2018-02-28
-
Publication No.: US11452557B2Publication Date: 2022-09-27
- Inventor: Kwang Chon Ko , Richard Howard Cohen
- Applicant: LUTRONIC CORPORATION
- Applicant Address: KR Goyang
- Assignee: LUTRONIC CORPORATION
- Current Assignee: LUTRONIC CORPORATION
- Current Assignee Address: KR Goyang
- Priority: KR10-2017-0041801 20170331
- International Application: PCT/KR2018/002436 WO 20180228
- International Announcement: WO2018/182187 WO 20181004
- Main IPC: A61B18/12
- IPC: A61B18/12 ; A61B18/14 ; A61B18/00

Abstract:
The present invention relates to an RF treatment apparatus, the method of controlling the RF treatment apparatus and the skin treatment method using RF energy according to the present invention have an effect in that they can improve the accuracy and efficiency of treatment because whether a target tissue corresponds to a treatment temperature is determined based on impedance of the tissue and the volume of the target tissue corresponding to the treatment temperature can be maximized while maintaining the target tissue to the treatment temperature for a predetermined time.
Public/Granted literature
Information query