Invention Grant
- Patent Title: Optical element, method for forming photo-alignment pattern, and method for manufacturing optical element
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Application No.: US17158710Application Date: 2021-01-26
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Publication No.: US11454752B2Publication Date: 2022-09-27
- Inventor: Katsumi Sasata , Ryoji Goto , Hiroshi Sato , Yukito Saitoh
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2018-141677 20180727
- Main IPC: G02B5/30
- IPC: G02B5/30

Abstract:
Provided are an optical element including a first optically-anisotropic layer consisting of a cured layer of a composition including a first liquid crystal compound, in which the first optically-anisotropic layer has 0.24 or more of a refractive index anisotropy Δn550 which is measured with light having a wavelength of 550 nm, the first optically-anisotropic layer has a first liquid crystal alignment pattern in which a direction of an optical axis derived from the first liquid crystal compound continuously changes rotationally in at least one in-plane direction, and in the first liquid crystal alignment pattern, in a case where a length Λ over which the direction of the optical axis rotates 180° in a plane is defined as a single period, the length Λ of the single period is 1.6 μm or less; a method for forming a photo-alignment pattern; and a method for manufacturing an optical element.
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