Invention Grant
- Patent Title: Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
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Application No.: US16556709Application Date: 2019-08-30
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Publication No.: US11454887B2Publication Date: 2022-09-27
- Inventor: Nitesh Pandey
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18193998 20180912
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20

Abstract:
Disclosed is a method and associated inspection apparatus for measuring a characteristic of interest relating to a structure on a substrate. The inspection apparatus uses measurement radiation comprising a plurality of wavelengths. The method comprises performing a plurality of measurement acquisitions of said structure, each measurement acquisition being performed using measurement radiation comprising a different subset of the plurality of wavelengths, to obtain a plurality of multiplexed measurement signals. The plurality of multiplexed measurement signals are subsequently de-multiplexed into signal components according to each of said plurality of wavelengths, to obtain a plurality of de-multiplexed measurement signals which are separated according to wavelength.
Public/Granted literature
- US20200081340A1 Metrology Apparatus and Method for Determining a Characteristic of One or More Structures on a Substrate Public/Granted day:2020-03-12
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