Invention Grant
- Patent Title: Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films
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Application No.: US17146683Application Date: 2021-01-12
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Publication No.: US11459347B2Publication Date: 2022-10-04
- Inventor: Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
- Applicant: Applied Materials, Inc. , National University of Singapore
- Applicant Address: US CA Santa Clara; SG Singapore
- Assignee: Applied Materials, Inc.,National University of Singapore
- Current Assignee: Applied Materials, Inc.,National University of Singapore
- Current Assignee Address: US CA Santa Clara; SG Singapore
- Agency: Servilla Whitney LLC
- Main IPC: C07F11/00
- IPC: C07F11/00 ; C23C16/455 ; C23C16/18
Abstract:
Molybdenum(IV) and molybdenum(III) coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
Public/Granted literature
- US20220220138A1 MOLYBDENUM(IV) AND MOLYBDENUM(III) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS Public/Granted day:2022-07-14
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