Invention Grant
- Patent Title: Method for determining candidate patterns from set of patterns of a patterning process
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Application No.: US17272505Application Date: 2019-09-20
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Publication No.: US11460784B2Publication Date: 2022-10-04
- Inventor: Venugopal Vellanki , Mark Christopher Simmons
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2019/075321 WO 20190920
- International Announcement: WO2020/064542 WO 20200402
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method of determining candidate patterns from a set of patterns of a patterning process. The method includes obtaining (i) a set of patterns of a patterning process, (ii) a search pattern having a first feature and a second feature, and (iii) a search condition comprising a relative position between the first feature and the second feature of the search pattern; and determining a set of candidate patterns from the set of patterns that satisfies the search condition associated with the first feature and the second feature of the search pattern.
Public/Granted literature
- US20210325786A1 METHOD FOR DETERMINING CANDIDATE PATTERNS FROM SET OF PATTERNS OF A PATTERNING PROCESS Public/Granted day:2021-10-21
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