An applicator device includes a top and a bottom layer of a flexible material tightly connected at their borders. An edge constitutes a grip zone to handle the applicator. Parallel weakening lines in each layer define an application section and closely surround a pad of a material capable to retain an agent or an elevation constituting a confinement structure for an agent. The superposition of weakening line and border of agent carrying material or the elevation constituting a part of the confinement structure avoids a contact of the flexible material with the surface to be treated as the carrying material layer or the confinement structure serve as a spacer. As a consequence, the applicator is suited to be used on highly sensitive surfaces like skin or mucosa.