- 专利标题: System and method for scanning a sample using multi-beam inspection apparatus
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申请号: US17251724申请日: 2019-06-07
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公开(公告)号: US11469076B2公开(公告)日: 2022-10-11
- 发明人: Martinus Gerardus Maria Johannes Massen , Joost Jeroen Ottens , Long Ma , Youfei Jiang , Weihua Yin , Wei-Te Li , Xuedong Liu
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 国际申请: PCT/EP2019/064919 WO 20190607
- 国际公布: WO2019/238553 WO 20191219
- 主分类号: H01J37/26
- IPC分类号: H01J37/26 ; H01J37/147 ; H01J37/22 ; H01J37/28
摘要:
An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
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