Invention Grant
- Patent Title: Speckle elimination apparatus, laser light source and laser projection system
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Application No.: US16753600Application Date: 2017-12-08
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Publication No.: US11474367B2Publication Date: 2022-10-18
- Inventor: Lebao Yang
- Applicant: GOERTEK INC.
- Applicant Address: CN Shandong
- Assignee: GOERTEK INC.
- Current Assignee: GOERTEK INC.
- Current Assignee Address: CN Shandong
- Agency: Paratus Law Group, PLLC
- Priority: CN201721571861.0 20171122
- International Application: PCT/CN2017/115239 WO 20171208
- International Announcement: WO2019/100452 WO 20190531
- Main IPC: G02B27/48
- IPC: G02B27/48 ; G03B21/20 ; G02B27/28

Abstract:
A speckle elimination apparatus, a laser light source and a laser projection system, the speckle elimination apparatus comprising a diaphragm (100) and a ¼ wave plate group sequentially arranged on a laser beam optical path, the ¼ wave plate group comprising a first ¼ wave plate (200) and a second ¼ wave plate (300) having optical axis angles of 75°-105°, adjacent sides of the first ¼ wave plate (200) and the second ¼ wave plate (300) being closely arranged, the first ¼ wave plate (200) being arranged so as to allow a portion of an incident laser beam to pass through, the second ¼ wave plate (300) being arranged so as to allow the remainder of the incident laser beam to pass through, the portion of the incident laser beam being 25%-75% of the incident laser beam. The speckle elimination apparatus eliminates the phenomenon of laser speckle.
Public/Granted literature
- US20200333616A1 SPECKLE ELIMINATION APPARATUS, LASER LIGHT SOURCE AND LASER PROJECTION SYSTEM Public/Granted day:2020-10-22
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