• Patent Title: Speckle elimination apparatus, laser light source and laser projection system
  • Application No.: US16753600
    Application Date: 2017-12-08
  • Publication No.: US11474367B2
    Publication Date: 2022-10-18
  • Inventor: Lebao Yang
  • Applicant: GOERTEK INC.
  • Applicant Address: CN Shandong
  • Assignee: GOERTEK INC.
  • Current Assignee: GOERTEK INC.
  • Current Assignee Address: CN Shandong
  • Agency: Paratus Law Group, PLLC
  • Priority: CN201721571861.0 20171122
  • International Application: PCT/CN2017/115239 WO 20171208
  • International Announcement: WO2019/100452 WO 20190531
  • Main IPC: G02B27/48
  • IPC: G02B27/48 G03B21/20 G02B27/28
Speckle elimination apparatus, laser light source and laser projection system
Abstract:
A speckle elimination apparatus, a laser light source and a laser projection system, the speckle elimination apparatus comprising a diaphragm (100) and a ¼ wave plate group sequentially arranged on a laser beam optical path, the ¼ wave plate group comprising a first ¼ wave plate (200) and a second ¼ wave plate (300) having optical axis angles of 75°-105°, adjacent sides of the first ¼ wave plate (200) and the second ¼ wave plate (300) being closely arranged, the first ¼ wave plate (200) being arranged so as to allow a portion of an incident laser beam to pass through, the second ¼ wave plate (300) being arranged so as to allow the remainder of the incident laser beam to pass through, the portion of the incident laser beam being 25%-75% of the incident laser beam. The speckle elimination apparatus eliminates the phenomenon of laser speckle.
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